Nelson Felix

Publications

• Evaluation of (110) versus (001) Channel Orientation for Improved nFET/pFET Device Performance Trade-Off in Gate-All-Around Nanosheet Technology

  • • Shogo Mochizuki
    • Nicolas Loubet
    • et al.
  • 2023
  • IEDM 2023

• Scaling opportunities for Gate-All-Around and beyond: A patterning perspective

  • • Indira Seshadri
    • Eric Miller
    • et al.
  • 2023
  • IEDM 2023

• Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around Transistors

  • • Curtis Durfee
    • Ivo Otto
    • et al.
  • 2023
  • SSDM 2023

• Etch and Patterning Development for 2nm Node Nanosheet Devices

  • • Eric Miller
    • Indira Seshadri
    • et al.
  • 2022
  • SPIE Advanced Lithography 2022

• Nanosheet Metrology Opportunities for Technology Readiness

  • • Mary Breton
    • Daniel Schmidt
    • et al.
  • 2021
  • SPIE Advanced Lithography 2021

• Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning

  • • Dexin Kong
    • Daniel Schmidt
    • et al.
  • 2020
  • SPIE Advanced Lithography 2020

• Exploration of pillar local CDU improvement options for AI applications

  • • Charlie Liu
    • Hao Tang
    • et al.
  • 2020
  • SPIE Advanced Lithography 2020

• Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

  • • Charlie Liu
    • Elliott Franke
    • et al.
  • 2018
  • Nature Electronics