Vertical Travelling Scatterometry for Metrology on Fully Integrated Devices
- D. Schmidt
- M. Medikonda
- et al.
- SPIE Advanced Lithography 2022
Mary is currently the manager of the Testsite Layout & Design group, within the IBM Hybrid Cloud Technology Research organization. The team focuses on semiconductor R&D for next generation technology.
Previously, Mary was the manager of the inline metrology group, which explores a variety of electron, optical, magnetic, scanning, and x-ray based techniques for dimensional and material measurements. In her first IBM fulltime role as a metrology engineer, she was heavily involved in inline CDSEM, AFM, and scatterometry projects.
On the side, Mary is involved with MIT & RPI recruiting for IBM, new hire programming, and pubbing cool things that Research works on through the Semiconductor site !
Mary's Bachelor of Science degree (S.B.) is from Massachusetts Institute of Technology (MIT) from the Department of Materials Science and Engineering (DMSE). She received her Masters of Engineering (M.Eng) from Rensselaer Polytechnic Institute's (RPI's) Materials Science and Engineering (MSE) Department in 2017 and researched under Dr. Robert Hull. She was a summer metrology intern at IBM's East Fishkill site developing an algorithm to reduce model build time for scatterometry projects before joining IBM full-time.