Submicrometer p-Type SiGe modulation-doped field-effect transistors for high speed applications
- I. Adesida
- M. Arafa
- et al.
- 1997
- Microelectronic Engineering
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Low temperature Al-Cu planarization by PVD Al-Cu-Ge alloys (Invited lecture)
- R.V. Joshi
- 1997
- Microelectronic Engineering
Gate oxide characterization with ballistic electron emission microscopy
- R. Ludeke
- H.J. Wen
- 1997
- Microelectronic Engineering
Electrical characterization of Si/Si0.7Ge0.3 quantum well wires fabricated by low damage CF4 reactive ion etching
- K.Y. Lee
- S.J. Koester
- et al.
- 1997
- Microelectronic Engineering
Potential fluctuations due to Pb centres at the Si/SiO2 interface
- M.J. Uren
- K.M. Brunson
- et al.
- 1997
- Microelectronic Engineering
On the relationship between stress induced leakage currents and catastrophic breakdown in ultra-thin SiO2 based dielectrics
- D.A. Buchanan
- J.H. Stathis
- et al.
- 1997
- Microelectronic Engineering
Reliability and integration of ultra-thin gate dielectrics for advanced CMOS
- D.A. Buchanan
- S.H. Lo
- 1997
- Microelectronic Engineering
Scaling silicon MOS devices to their limits
- S.J. Wind
- D.J. Frank
- et al.
- 1996
- Microelectronic Engineering
Electron-beam microcolumn fabrication and testing
- M. Despont
- U. Staufer
- et al.
- 1996
- Microelectronic Engineering
The nanoworld: Chances and challenges
- Heinrich Rohrer
- 1996
- Microelectronic Engineering