IBM Lithography Roadmap and Need for Future Lithography Tools
- Allen Gabor
- Martin Burkhardt
- et al.
- 2025
- EUVL and Source Workshop 2025
Publications
25 results for Allen Gabor
Wet clean oxidation for optimal line width and LER
- Steven McDermott
- Keith Donegan
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
- Romain Lallement
- Daniel Schmidt
- et al.
- 2023
- OEN 2023
Bayesian dropout approximation in deep learning neural networks: Analysis of self-Aligned quadruple patterning
- Scott D. Halle
- Derren N. Dunn
- et al.
- 2022
- JM3
Predicting overlay mark performance based on process emulation and optical simulation
- Sagarika Mukesh
- Jack Wong
- et al.
- 2022
- SPIE Advanced Lithography 2022
Effect of high NA "half-field" printing on overlay error
- Allen Gabor
- Martin Burkhardt
- et al.
- 2021
- SPIE Advanced Lithography 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning
- Scott D. Halle
- Max O. Bloomfield
- et al.
- 2020
- SPIE Advanced Lithography 2020
Characterization of EUV image fading induced by overlay corrections using pattern shift response metrology
- Daniel Schmidt
- Roger Cornell
- et al.
- 2019
- EUVL 2019
Overlay error statistics for multiple-exposure patterning
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS