Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
- Hiroyuki Miyazoe
- Sebastian U. Engelmann
- et al.
- 2017
- JVSTA
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108 results for Sebastian Engelmann
A novel approach to photonic packaging leveraging existing high-throughput microelectronic facilities
- Tymon Barwicz
- Yoichi Taira
- et al.
- 2016
- IEEE JSTQE
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- Journal of Chemical Physics
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB
Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2015
- JVSTB
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions
- Jonathan Tennyson
- Sebastian Mohr
- et al.
- 2022
- Plasma Sources Science and Technology
Photonic metacrystal: Design methodology and experimental characterization
- S. Hu
- Marwan H. Khater
- et al.
- 2022
- Optics Express
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
- S. G. Walton
- D. R. Boris
- et al.
- 2021
- JVSTA
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
- L. Buzi
- Hiroyuki Miyazoe
- et al.
- 2020
- JVSTA