Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around Transistors
- Curtis Durfee
- Ivo Otto
- et al.
- 2023
- SSDM 2023
Publications
58 results for Luciana Meli
Overlay Performance in Permanent Bonded Wafer Integration Schemes
- Nathan Ip
- Michael Belyansky
- et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023
EUV sub-resolution assist feature impact: experimental and simulation evaluation
- Zheng Chen
- Martin Burkhardt
- et al.
- 2023
- OEN 2023
Focus considerations of design pitches and absorber choice for EUV random logic
- Martin Burkhardt
- Zheng Chen
- et al.
- 2022
- OEN 2022
Throughput vs. Yield: reviewing the metrology needs for stochastics-aware process window analysis (SA-PWA)
- Jennifer Church
- Luciana Meli
- 2022
- SPIE Advanced Lithography 2022
Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- Katie Lutker-Lee
- Jennifer Church
- et al.
- 2022
- Journal of Vacuum Science and Technology B
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization
- Xinghua Sun
- Yann Mignot
- et al.
- 2022
- Journal of Vacuum Science and Technology B
Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- Jennifer Church
- Graham Jensen
- et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
A holistic characterization methodology for stochastic printing failures in EUV contact holes
- Jennifer Church
- Brad Austin
- et al.
- 2021
- ASMC 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021