IBM Lithography Roadmap: Shorter‑Wavelength Lithography, Resist and Mask Requirements to Reduce Stochastic Defects
- Allen Gabor
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
64 results for Luciana Meli
IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- Allen Gabor
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperScaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperEvaluation of High NA EUV for Subtractive Interconnect Patterning in Advanced Nodes
- Chris Penny
- Joe Lee
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperMetal-Oxide Resist Develop Method Down-Select and Process Optimization
- Nicholas Latham
- Belle Antonovich
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperExploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
TalkIBM Lithography Roadmap and Need for Future Lithography Tools
- Allen Gabor
- Martin Burkhardt
- et al.
- 2025
- EUVL and Source Workshop 2025
KeynoteNanoStack Transistor Architecture for CMOS 7A Node and Beyond
- S. Reboh
- C. Zhang
- et al.
- 2025
- VLSI Technology and Circuits 2025
Conference paperHigh Volume Manufacturing Innovations for Metal-Oxide Resist Patterning
- Nicholas Latham
- Jennifer Church
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paperAccelerating High NA EUV Lithography Insertion for Interconnect Scaling and Beyond: Performance, Cost, and Future Prospects
- Luciana Meli
- Indira Seshadri
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paper