Characterization of a Novolac-Based Three-Component Deep-UV Resist
- Dennis R. McKean
- Scott A. MacDonald
- et al.
- 2002
- Chemistry of Materials
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29 results for N.J. Clecak
Plasma-Developable Photoresist Systems Based on Chemical Amplification
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 2002
- Chemistry of Materials
A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal
- Scott A. MacDonald
- Nicholas J. Clecak
- et al.
- 2002
- Chemistry of Materials
Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1994
- Chemistry of Materials
Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles
- J. Fahey
- K. Shimizu
- et al.
- 1993
- Journal of Polymer Science Part A: Polymer Chemistry
Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem
- Scott A. MacDonald
- William D. Hinsberg
- et al.
- 1993
- Chemistry of Materials
Deep UV Photoresists I. Meldrum's Diazo Sensitizer
- Barbara D. Grant
- Nicholas J. Clecak
- et al.
- 1981
- IEEE T-ED
Thermal properties of 4-alkyl-4′-cyanotolanes: a new series of liquid crystals
- Robert J. Cox
- Richard C. Gaskill
- et al.
- 1977
- Thermochimica Acta
Thermal properties of 4-alkyl-4′-cyanostilbenes: a new series of liquid crystal compounds
- Robert J. Cox
- Richard C. Gaskill
- et al.
- 1977
- Thermochimica Acta