Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
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29 results for N.J. Clecak
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988