pFET V t control with HfO 2/TiN/poly-Si gate stack using a lateral oxygenation process
- B. Cartier
- M. Steen
- et al.
- 2009
- VLSI Technology 2009
Publications
90 results for Martin M Frank
Quasi-damascene metal gate/high-k CMOS using oxygenation through gate electrodes
- Changhwan Choi
- Takashi Ando
- et al.
- 2009
- Microelectronic Engineering
Scaling the MOSFET gate dielectric: From high-k to higher-k? (Invited Paper)
- Martin M. Frank
- SangBum Kim
- et al.
- 2009
- Microelectronic Engineering
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gate
- K. Henson
- H. Bu
- et al.
- 2008
- IEDM 2008
The relationship between local order, long range order, and sub-band-gap defects in hafnium oxide and hafnium silicate films
- D.H. Hill
- R.A. Bartynski
- et al.
- 2008
- Journal of Applied Physics
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
- E. Kesters
- M. Claes
- et al.
- 2008
- Thin Solid Films
Impact of metal gates on remote phonon scattering in titanium nitride/hafnium dioxide n -channel metal-oxide-semiconductor field effect transistors-low temperature electron mobility study
- Kingsuk Maitra
- Martin M. Frank
- et al.
- 2007
- Journal of Applied Physics
Atomic layer deposition for CMOS scaling: High-k gate dielectrics on Si, Ge, and III-V semiconductors
- 2007
- ECS Meeting 2007
Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
- G.G. Totir
- M.M. Frank
- et al.
- 2007
- ECS Meeting 2007
Hydrogen Barrier Layer Against Silicon Oxidation during Atomic Layer Deposition of Al2 O3 and Hf O2
- Martin M. Frank
- Yu Wang
- et al.
- 2007
- JES