Conference paper
Improving silicon crystallinity by grain reorientation annealing
K.L. Saenger, J.P. De Souza, et al.
MRS Spring Meeting 2009
We report on the dc and RF characterization of laterally scaled, Si - SiGe n-MODFETs. Devices with gate length, Lg, of 80 nm had fT = 79 Ghz and fmax = 212 Ghz, while devices with Lg = 70 nm had fT as high as 92 Ghz. The MODFETs displayed enhanced fT at reduced drain-to-source voltage, Vds, compared to Si MOSFETs with similar fT at high Vds. © 2005 IEEE.
K.L. Saenger, J.P. De Souza, et al.
MRS Spring Meeting 2009
G. Dehlinger, S.J. Koester, et al.
IEEE Photonics Technology Letters
P.M. Mooney, J.L. Jordan-Sweet, et al.
Applied Physics Letters
K.L. Lee, F. Cardone, et al.
IEDM 2003