Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

25 results for Donald Canaperi

Advanced Arsenic Doped Epitaxial Growth for Source Drain Extension Formation in Scaled FinFET Devices
- - S. Mochizuki
  - B. Colombeau
  - et al.
- 2018
- IEDM 2018
Fully aligned via integration for extendibility of interconnects to beyond the 7 nm node
- - Benjamin D. Briggs
  - C.B. Peethala
  - et al.
- 2017
- IEDM 2017
Comparison of key fine-line BEOL metallization schemes for beyond 7 nm node
- - T. Nogami
  - X. Zhang
  - et al.
- 2017
- VLSI Technology 2017
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
- - Tenko Yamashita
  - S. Mehta
  - et al.
- 2015
- VLSI Technology 2015
Through-Cobalt Self Forming Barrier (tCoSFB) for Cu/ULK BEOL: A novel concept for advanced technology nodes
- - T. Nogami
  - Benjamin D. Briggs
  - et al.
- 2015
- IEDM 2015
CMP Defect Reduction and Mitigation: Practices and Future Trends
- - Wei-Tsu Tseng
  - Carol Boye
  - et al.
- 2021
- ASMC 2021
Novel low k Dielectric materials for nano device interconnect technology
- - Son Van Nguyen
  - H. Shobha
  - et al.
- 2020
- VLSI-TSA 2020
Method for improving stability of plasma ignition in a multi-cathode magnetron PVD system
- - Jessica Gruss-Gifford
  - V. Mehta
  - et al.
- 2020
- ASMC 2020
Modified ALD TaN Barrier with Ru Liner and Dynamic Cu Reflow for 36nm Pitch Interconnect Integration
- - P. Bhosale
  - J. Maniscalco
  - et al.
- 2018
- IITC 2018