Why the close-packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surfaceC.R. Brundle1985JVSTA
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsT.C. HuangG. Limet al.1985JVSTA
Summary Abstract: Modification of metals by low energy ions during thin film depositionJ.M.E. HaroerJ.J. Cuomo1985JVSTA
Summary Abstract: Titanium silicide films prepared by reactive sputteringV. DelineF.M. d’Heurle1985JVSTA
High resolution photoemission investigation: The oxidation of WGuy HollingerF.J. HimDselet al.1985JVSTA
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMSD.J. VitkavageJ.G. Clabeset al.1985JVSTA