Summary Abstract: The origin of oxidation induced enhancement of Si⁺ sputter yield in SIMS

R.D. Murphy, R.O. Watts

Journal of Low Temperature Physics

P. Martensson, R.M. Feenstra

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Shiyi Chen, Daniel Martínez, et al.

Physics of Fluids

K.N. Tu

Materials Science and Engineering: A