Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and the availability of active empty clusters of adsorption sites of certain sizes and configurations. © 1985, American Vacuum Society. All rights reserved.
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
E. Burstein
Ferroelectrics
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Lawrence Suchow, Norman R. Stemple
JES