A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet DevicesNicolas LoubetT. Devarajanet al.2019IEDM 2019
High-throughput, nondestructive assessment of defects in patterned epitaxial films on silicon by machine learning-enabled broadband plasma optical measurementsShravan MathamC. Durfeeet al.2019ASMC 2019
Parasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nmHeng WuOleg Gluschenkovet al.2018IEDM 2018
External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS TechnologyOleg GluschenkovHeng Wuet al.2018IEDM 2018
Leakage aware Si/SiGe CMOS FinFET for low power applicationsG. TsutsuiC. Durfeeet al.2018VLSI Technology 2018
Integrated dual SPE processes with low contact resistivity for future CMOS technologiesHeng WuSoon-Cheon Seoet al.2017IEDM 2017