About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
VLSI Technology 2018
Conference paper
Leakage aware Si/SiGe CMOS FinFET for low power applications
Abstract
Leakage in Si/SiGe CMOS FinFET is examined. Si cap passivation effectively improves SiGe pFET Dit, subthreshold slope, and mobility, which improves pFET DC performance by 20%. SiGe GIDL is higher than Si by a factor of 9, though GIDL is limited to 50pA/um. SiGe GIDL reduction knobs to meet Si counterpart are demonstrated. The results open the door to the next stage of Si/SiGe CMOS FinFET such as low power and low leakage applications.