Overlay statistics for multiple exposure patterning
- 2017
- SPIE Advanced Lithography 2017
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23 results for Allen Gabor
Mix-and-match considerations for EUV insertion in N7 HVM
- Xuemei Chen
- Allen Gabor
- et al.
- 2017
- SPIE Advanced Lithography 2017
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Measuring layer-specific depth-of-focus requirements
- Bernhard Liegl
- Allen Gabor
- et al.
- 2008
- SPIE Advanced Lithography 2008
Improving the power-performance of multicore processors through optimization of lithography and thermal processing
- A. Gabor
- T.A. Brunner
- et al.
- 2007
- SPIE Advanced Lithography 2007
Patterning strategies for gate level tip-tip distance reduction in SRAM cell for 45nm and beyond
- Haoren Zhuang
- Helen Wang
- et al.
- 2007
- ISTC 2007
RTA-driven intra-die variations in stage delay, and parametric sensitivities for 65nm technology
- I. Ahsan
- N. Zamdmer
- et al.
- 2006
- VLSI Technology 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006