Publications

109 results for Sebastian Engelmann

A metamaterial converter centered at 1490nm for interfacing standard fibers to nanophotonic waveguides
- - Tymon Barwicz
  - Nicolas Boyer
  - et al.
- 2016
- OFC 2016
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- - Dominik Metzler
  - Florian Weilnboeck
  - et al.
- 2016
- JVSTB
Evaluation of ALE processes for patterning
- - J. M. Papalia
  - Nathan Marchack
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- - Sebastian U. Engelmann
  - Qinghuang Lin
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Fluorocarbon assisted atomic layer etching of SiO₂ and Si using cyclic Ar/C₄F₈ and Ar/CHF₃ plasma
- - Dominik Metzler
  - Chen Li
  - et al.
- 2016
- JVSTA
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T_e plasma sources
- - Ashish Jagtiani
  - Hiroyuki Miyazoe
  - et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- - Dominik Metzler
  - Kishore Uppireddi
  - et al.
- 2016
- JVSTA
SiGe-on-insulator symmetric lateral bipolar transistors
- - Jeng-Bang Yau
  - Jin Cai
  - et al.
- 2015
- S3S 2015
Enabling large-scale deployment of photonics through cost-efficient and scalable packaging
- - Tymon Barwicz
  - Yoichi Taira
  - et al.
- 2015
- GFP 2015
Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- - Dominik Metzler
  - Florian Weilnboeck
  - et al.
- 2015
- JVSTB