Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

26 results for Charlie Liu

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Advanced fast 3D DSA model development and calibration for design technology co-optimization
- - Kafai Lai
  - Balint Meliorisz
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Directed self-assembly patterning strategies for phase change memory applications
- - R. L. Bruce
  - Gloria Fraczak
  - et al.
- 2017
- SPIE Advanced Lithography 2017
An OCD perspective of line edge and line width roughness metrology
- - Ravi Bonam
  - R. Muthinti
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- - Ravi Bonam
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- - Kristin Schmidt
  - Hitoshi Osaki
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA patterning options for FinFET formation at 7nm node
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2016
- SPIE Advanced Lithography 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- - Hsinyu Tsai
  - H. Miyazoe
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- - Eri Hirahara
  - Margareta Paunescu
  - et al.
- 2015
- SPIE Advanced Lithography 2015