Bench evaluation of lithographic lenses from measurements of the point spread function
- Norman Bobroff
- Petra Fadi
- et al.
- 1989
- Proceedings of SPIE 1989
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49 results for Alan E. Rosenbluth
Determination of thickness errors and boundary roughness from the measured performance of a multilayer coating
- Eberhard Spiller
- Alan E. Rosenbluth
- 1989
- Proceedings of SPIE 1989
Multiple stages of regression to improve accuracy in calibrated lithography process models
- Pardeep Kumar
- Alan E. Rosenbluth
- et al.
- 2018
- J. Micro/Nanolithogr. MEMS MOEMS
Layout optimization method to equalize the best-focus position of different patterns
- Jaione Tirapu-Azpiroz
- Alan E. Rosenbluth
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Design of phase-controlled coatings to correct skew-ray depolarization in LCOS projectors
- Alan E. Rosenbluth
- Minhua Lu
- et al.
- 2002
- Displays
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Twisted-film compensated twist nematic and double twist nematic modes for achromatic reflective displays
- Minhua Lu
- K.H. Yang
- et al.
- 2000
- Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Optimization of light-valve mirrors
- E.G. Colgan
- F.E. Doany
- et al.
- 1998
- Journal of the Society for Information Display