Point defects, diffusion processes, and swirl defect formation in silicon
- T.Y. Tan
- U. Gösele
- 1985
- Applied Physics A Solids and Surfaces
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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22 results for T.Y. Tan
In depth generation lifetime profiling of heat‐treated czochralski silicon
- D. Braunig
- K.H. Yang
- et al.
- 1985
- physica status solidi (a)
Chemical and structural aspects of reaction at the Ti/Si interface
- R. Butz
- G.W. Rubloff
- et al.
- 1984
- Physical Review B
Chemical reaction and Schottky-barrier formation at V/Si interfaces
- J.G. Clabes
- G.W. Rubloff
- et al.
- 1984
- Physical Review B
Observation of oxidation-enhanced and oxidation-retarded diffusion of antimony in silicon
- T.Y. Tan
- B.J. Ginsberg
- 1983
- Applied Physics Letters
Effects of variations of silicide characteristics on the Schottky-barrier height of silicide-silicon interfaces
- P.E. Schmid
- P.S. Ho
- et al.
- 1983
- Physical Review B
On the nature of point defects and the effect of oxidation on substitutional dopant diffusion in silicon
- T.Y. Tan
- U. Gösele
- et al.
- 1983
- Applied Physics A Solids and Surfaces
Oxidation-enhanced or retarded diffusion and the growth or shrinkage of oxidation-induced stacking faults in silicon
- T.Y. Tan
- U. Gösele
- 1982
- Applied Physics Letters
Kinetics of silicon stacking fault growth/shrinkage in an oxidizing ambient containing a chlorine compound
- T.Y. Tan
- U. Gösele
- 1982
- Journal of Applied Physics
Oxygen diffusion and thermal donor formation in silicon
- U. Gösele
- T.Y. Tan
- 1982
- Applied Physics A Solids and Surfaces