J.H. Stathis, R. Bolam, et al.
INFOS 2005
A field effect transistor device (FET), consisting of a nonlinear Mott Insulator channel material, and a high dielectric-constant gate oxide, is explored as a nanoscale device. Experimental functionality of a large scale prototype (5 μm channel length) has been demonstrated. The underlying physics of the device is analyzed and modeled using a time-dependent Hartree approach. Timing estimates suggest a relatively short switching time.
J.H. Stathis, R. Bolam, et al.
INFOS 2005
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992