TAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
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22 results at Microlithography 1993
Comparison of scalar and vector diffraction modelling for deep-UV lithography
- Bruce W. Smith
- Donis G. Flagello
- et al.
- 1993
- Microlithography 1993
Vector diffraction analysis of phase-mask imaging in photoresist films
- Donis G. Flagello
- Alan E. Rosenbluth
- 1993
- Microlithography 1993
Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- T.A. Brunner
- 1993
- Microlithography 1993
170 nm gates fabricated by phase-shift mask and top anti-reflector process
- T.A. Brunner
- P.N. Sanda
- et al.
- 1993
- Microlithography 1993
Developments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Process optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Photoresist process latitude optimization for synchrotron x-ray lithography
- Andrew T. Pomerene
- David E. Seeger
- et al.
- 1993
- Microlithography 1993
Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993