Characterization and simulation of acid catalyzed DUV positive photoresist
- Nicholas K. Eib
- Eytan Barouch
- et al.
- 1993
- Microlithography 1993
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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22 results at Microlithography 1993
New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Resist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Comparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
The influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Base-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993