Role of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of diamondlike carbon using a planar radio frequency induction plasma
- D.L. Pappas
- J. Hod wood
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Si(100)2-1+Sb surfaces studied with photoemission and optical spectroscopy
- H. Bernhoff
- D. Purdie
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- O. Joubert
- G.S. Oehrlein
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Modification of the PHI sample mount for multiple- or micropositioning for Zalar rotation
- Paul Soo
- David L. Neiman
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor
- W.M. Holber
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of energy reflected from the target on thin film characteristics
- Harold F. Winters
- H. Coufal
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Directionality of Sputtered Cu Atoms in A Hollow Cathode Enhanced Planar Magnetron
- S.M. Rossnagel
- J.J. Cuomo
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- James W. Corbett
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films