Practical characterization of 0.5 μm optical lithography
- Donis G. Flagello
- Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989
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3520 results for Mathematical Sciences
Reading and writing of photochemical holes using gaalas diode lasers
- P. Pokrowsky
- W.E. Moerner
- et al.
- 1989
- Proceedings of SPIE 1989
Condenser aberrations in Köhler illumination
- Douglas S. Goodman
- Alan E. Rosenbluth
- 1989
- Proceedings of SPIE 1989
Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors
- Hiroshi Ito
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Aqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Gel resist processing for submicron CMOS and bipolar circuits
- K.E. Petrillo
- M. Smyth
- et al.
- 1989
- Proceedings of SPIE 1989
Bench evaluation of lithographic lenses from measurements of the point spread function
- Norman Bobroff
- Petra Fadi
- et al.
- 1989
- Proceedings of SPIE 1989
Soft x-ray diffraction of striated muscle
- S.F. Fan
- W.B. Yun
- et al.
- 1989
- Proceedings of SPIE 1989
Two-regime ablative hole formation process in tellurium and tellurium-alloy films
- M. Chen
- V. Marrello
- et al.
- 1989
- Proceedings of SPIE 1989