A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
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29 results for N.J. Clecak
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Fundamental studies of airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
An Explanation of the Electrochromism of Lutetium Diphthalocyanine
- G.A. Corker
- B. Grant
- et al.
- 2019
- JES
Azide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
Study of the Electrochromism of Methoxyfluorene Compounds
- Barbara Grant
- N.J. Clecak
- et al.
- 2002
- Journal of Organic Chemistry
Synthesis and Proof of Structure of 2,6-Diaminobenzo [1,2-d: 4,5-d′]bisthiazole
- S.L. Solar
- R.J. Cox
- et al.
- 2002
- Journal of Organic Chemistry