International Technical Conference on Photopolymers 1991
Conference paper

Top-surface-imaging resist for deep UV lithography


There are several processing advantages associated with a DUV surface imaging system. This paper investigates schemes to convert negative tone plasma developable resists into top-surface-imaging systems. This can be done by adding a strongly absorbing chromophore (dye) to the resist formulation. This paper discusses two methods of introducing dye to the resist system.