Fundamental studies of airborne chemical contamination of chemically amplified resists

Abstract

The susceptibility of most chemically amplified resists to performance degradation caused by low levels of airborne basic chemical substances presents a significant barrier to their practical implementation. We have carried out a series of systematic studies intended to improve our understanding of the mechanism of such degradation. We summarize here our investigation of how the contaminant/resist interaction is influenced by resist film composition. Our results suggest that contamination effects can be minimized y targeting specific ranges of physical properties when designing the matrix polymer. © 1993, The Society of Photopolymer Science and Technology(SPST). All rights reserved.