Publications

59 results for Nicolas Loubet

In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing
- - Daniel Schmidt
  - Curtis Durfee
  - et al.
- 2022
- JM3
Paper
Gate-Last IO Transistors based on Stacked Gate-All-Around Nanosheet Architecture for Advanced Logic Technologies
- - M. Bhuiyan
  - M. Kim
  - et al.
- 2021
- IEDM 2021
Conference paper
Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Conference paper
Dual Damascene BEOL Extendibility With Cu Reflow / Selective TaN And Co/Cu Composite
- - P. Bhosale
  - N. Lanzillo
  - et al.
- 2021
- VLSI Technology 2021
Conference paper
Enabling Next Generation CMOS by Novel EOT Scaling Module
- - Lin Dong
  - Steven Hung
  - et al.
- 2021
- VLSI Technology 2021
Conference paper
In-line Raman spectroscopy for stacked nanosheet device manufacturing
- - Daniel Schmidt
  - C. Durfee
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper
Stacked Gate-All-Around Nanosheet pFET with Highly Compressive Strained Si1-xGex Channel
- - Shogo Mochizuki
  - M. Bhuiyan
  - et al.
- 2020
- IEDM 2020
Conference paper
Improved Air Spacer for Highly Scaled CMOS Technology
- - Kangguo Cheng
  - Chanro Park
  - et al.
- 2020
- IEEE Transactions on Electron Devices
Paper
Parasitic Resistance Reduction for Aggressively Scaled Stacked Nanosheet Transistors
- - Su-Chen Fan
  - Ruilong Xie
  - et al.
- 2020
- IITC 2020
Conference paper
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Conference paper