Publications

57 results for Nicolas Loubet

Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Enabling Next Generation CMOS by Novel EOT Scaling Module
- - Lin Dong
  - Steven Hung
  - et al.
- 2021
- VLSI Technology 2021
Dual Damascene BEOL Extendibility With Cu Reflow / Selective TaN And Co/Cu Composite
- - P. Bhosale
  - N. Lanzillo
  - et al.
- 2021
- VLSI Technology 2021
In-line Raman spectroscopy for stacked nanosheet device manufacturing
- - Daniel Schmidt
  - C. Durfee
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Stacked Gate-All-Around Nanosheet pFET with Highly Compressive Strained Si1-xGex Channel
- - Shogo Mochizuki
  - M. Bhuiyan
  - et al.
- 2020
- IEDM 2020
Improved Air Spacer for Highly Scaled CMOS Technology
- - Kangguo Cheng
  - Chanro Park
  - et al.
- 2020
- IEEE Transactions on Electron Devices
Parasitic Resistance Reduction for Aggressively Scaled Stacked Nanosheet Transistors
- - Su-Chen Fan
  - Ruilong Xie
  - et al.
- 2020
- IITC 2020
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Structural and Electrical Demonstration of SiGe Cladded Channel for PMOS Stacked Nanosheet Gate-All-Around Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2020
- VLSI Technology 2020
Composite Interconnects for High-Performance Computing beyond the 7nm Node
- - P. Bhosale
  - S. Parikh
  - et al.
- 2020
- VLSI Technology 2020