Publications

58 results for Luciana Meli

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- - Chris Robinson
  - Cody Murray
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Exploration of pillar local CDU improvement options for AI applications
- - Charlie Liu
  - Hao Tang
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
EUV mask challenges and requirements for ultimate single exposure interconnects
- - Chris Progler
  - Michael Green
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Investigation of mask absorber induced image shift in EUV lithography
- - Martin Burkhardt
  - Anuja De Silva
  - et al.
- 2019
- SPIE Advanced Lithography 2019
LCDU improvement of EUV-patterned vias with DSA
- - Jing Guo
  - Dustin W. Janes
  - et al.
- 2019
- MEMS/NEMS/MOEMS 2019