A holistic characterization methodology for stochastic printing failures in EUV contact holes
- Jennifer Church
- Brad Austin
- et al.
- 2021
- ASMC 2021
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25 results for Jennifer Church
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Contact local CD uniformity optimization through etch shrink
- Eric Miller
- Junling Sun
- et al.
- 2021
- SPIE Advanced Lithography 2021
Nanosheet Metrology Opportunities for Technology Readiness
- Mary Breton
- Daniel Schmidt
- et al.
- 2021
- SPIE Advanced Lithography 2021
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- A. Dutta
- Jennifer Church
- et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
Investigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
Throughput vs. Yield: reviewing the metrology needs for stochastics-aware process window analysis (SA-PWA)
- Jennifer Church
- Luciana Meli
- 2022
- SPIE Advanced Lithography 2022