Publication
IEEE J-EDS
Paper

Top-bottom gate coupling effect on low frequency noise in a schottky junction gated silicon nanowire field-effect transistor

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Abstract

In this letter, strong low frequency noise (LFN) reduction is observed when the buried oxide (BOX)/silicon interface of a Schottky junction gated silicon nanowire field-effect transistor (SJGFET) is depleted by a substrate bias. Such LFN reduction is mainly attributed to the dramatic reduction in Coulomb scattering when carriers are pushed away from the interface. The BOX/silicon interface depletion can also be achieved by sidewall Schottky junction gates in a narrow channel SJGFET, leading to an optimal LFN performance without the need of any substrate bias.

Date

01 Jan 2019

Publication

IEEE J-EDS

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