Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine

Abstract

A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO. © 1996 American Vacuum Society.