Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The spatial extent of the de-protection reaction was studied in sub-100 nm films over length scales relevant to lithographic resolution. A variation of a diffusional length technique using a bilayer sample prepared by spin coating a film of de-protected polymer loaded with a photoacid generator PAG on top of an ultrathin protected polymer layer was introduced. By studying bilayer samples prepared under identical exposure and PEB conditions, possible changes were replated to confinement-induced effects from either the substrate or the confined polymer material.
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano