PublicationADMETA 2010Conference paperCompetitive and cost effective copper/low-k interconnect (BEOL) for 28nm CMOS technologiesADMETA 2010AbstractNo abstract available.Home↳ PublicationsDate01 Dec 2010PublicationADMETA 2010AuthorsRod AugurCraig ChildJ.H. AhnTeck Jung TangL. ClevengerD. KioussisH. MasudaR. SrivastavaY. OdaH. OgumaR. QuonB. KimH. ShengS. HirookaR. GuptaAlan ThomasS.M. SinghQ. FangR. SchiwonBassem HamiehE. WornyoS. AllenErdem KaltaliogluT. FryxellAtsushi OginoE. ShimadaH. AizawaH. MindaS.O. KimT. OkiK. FujiiM. PallachalilT. TakewakiC.-K. HuB. SundloffD. PermanaTibor BolomB. EngelCatherine LabelleB. SappH. ShobhaS. GatesE.T. RyanG. BonillaT. DaubenspeckT.M. ShawG. OsborneAlfred GrillD. EdelsteinD.D. RestainoSteven MolisT. SpoonerPaul FerreiraGlenn BieryRon SampsonIBM-affiliated at time of publicationTopicsPhysical SciencesShare
