Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Capillary forces naturally present during normal drying of photoresist materials were eliminated by developing a supercritical drying process. Supercritical carbon dioxide, organic solvents and surfactants were used to prevent the collapse of high-aspect-ratio structures fabricated from aqueous-based photoresist. The replacement of the aqueous rinse by n-hexane mediated by a compatible surfactant was introduced.
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
K.N. Tu
Materials Science and Engineering: A
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993