Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates
- Sang-Min Park
- Mark P. Stoykovich
- et al.
- 2007
- Advanced Materials
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6 results for Paul F. Nealey
Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates
- Erik W. Edwards
- Martha F. Montague
- et al.
- 2004
- Advanced Materials
The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning
- Tzu-Hsuan Chang
- Shisheng Xiong
- et al.
- 2017
- Macromolecular Rapid Communications
Image collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
- Darío L. Goldfarb
- Juan J. De Pablo
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures