Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
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3523 results for Mathematical Sciences
Sensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Methods for comparing contact hole shrinking techniques with 248 nm single layer and bilayer photoresists
- Karen Petrillo
- John Simons
- et al.
- 2002
- Microlithography 2002
Characterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
Building high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
Multiple Parameter Continuation: Computing Implicitly Defined k-Manifolds
- Michael E. Henderson
- 2002
- IJBC
PACS and electronic health records
- Simona Cohen
- Flora Gilboa
- et al.
- 2002
- SPIE Medical Imaging 2002
Learning to annotate video databases
- Milind R. Naphade
- Ching-Yung Lin
- et al.
- 2002
- IS&T/SPIE Electronic Imaging 2002
Video summarization and personalization for pervasive mobile devices
- Belle L. Tseng
- Ching-Yung Lin
- et al.
- 2002
- IS&T/SPIE Electronic Imaging 2002
Graduated profiling: Enumerating and generating perceptual colormaps for uncalibrated computer displays
- Alan D. Kalvin
- 2002
- IS&T/SPIE Electronic Imaging 2002