Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A parsimonious integer-programming model for all-different constraints was developed. The all-different polytopes were defined and results on dimension, facets and separation were given. Some results from computational experiments concerning the facial structure of the all-different polytopes were also described.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
James Lee Hafner
Journal of Number Theory
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002