The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- John B.O. Caughman
- William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
14329 results for Physical Sciences
Thermal stress-induced and electromigration-induced void-open failures in Al and Al-Cu fine lines
- T. Kwok
- K.K. Chan
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Theory of Schottky barrier and metallization
- I.P. Batra
- E. Tekman
- et al.
- 1991
- Progress in Surface Science
Photogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitution
- Stephen Matuszczak
- James F. Cameron
- et al.
- 1991
- Journal of Materials Chemistry
Photoresist technology for 0.25 μm lithography
- Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991
Microscopic view of scanning tunneling microscopy
- Julian Chen
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Aspects in the progression of materials and processes for 256Mb-DRAM and beyond
- Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
Response to "Comments on the paper 'Coupling capacitances in VLSI Circuits calculated by multi-dimensional discrete fourier-series'"
- F.S. Lai
- 1991
- Solid State Electronics
Antiferromagnetic and ferromagnetic order in Co/Ru multilayers
- Y.Y. Huang
- G.P. Felcher
- et al.
- 1991
- Journal of Magnetism and Magnetic Materials
Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- K. Chiong
- F.J. Hohn
- 1990
- Microlithography 1990