The atomic structure of the NiSi2~Si(111) interface
- E.J. van Loenen
- 1986
- JVSTA
Publications
176 results at JVSTA
Calorimetry in thin film processing
- S. Shivashankar
- B. Robinson
- 1986
- JVSTA
Characterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
Summary Abstract: Chemical processes in fluorine-based etching reactions
- F.R. McFeely
- 1985
- JVSTA
Secondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
Summary Abstract: Energy distributions of electronically excited molecules produced by ion bombardment of silicon
- R.E. Walkup
- Ph. Avouris
- 1985
- JVSTA
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA