Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsa)
- J. Perrin
- B. Despax
- et al.
- 1986
- JVSTA
Publications
176 results at JVSTA
Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorder
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 1986
- JVSTA
Summary Abstract: Thin films for magnetic recording technology: A review
- J.K. Howard
- 1985
- JVSTA
Why the close-packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surface
- C.R. Brundle
- 1985
- JVSTA
Adsorbate-surface and adsorbate-adsorbate interactions and their role in surface reactions
- N.D. Lanq
- 1985
- JVSTA
The etching of W(111) with XeF2
- Harold F. Winters
- 1985
- JVSTA
Summary Abstract: Comparison between the adsorption of PH3 and B2H6 on Si surfaces as related to the CVD of Si
- M.L. Yu
- D.J. Vitkavage
- et al.
- 1985
- JVSTA
Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structures
- J.W. Bartha
- U. Barjenbruch
- et al.
- 1985
- JVSTA
Characterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA