Aspects in the progression of materials and processes for 256Mb-DRAM and beyond
- Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
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3490 results for Mathematical Sciences
Photoresist technology for 0.25 μm lithography
- Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991
Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- K. Chiong
- F.J. Hohn
- 1990
- Microlithography 1990
Accurate full-wave approach for modeling patch antennas
- Barry J. Rubin
- R.A. York
- et al.
- 1990
- International Conference on Infrared and Millimeter Waves 1990
Full-wave analysis of counectors in high-speed computer packages
- Moises Cases
- Barry J. Rubin
- 1990
- International Conference on Infrared and Millimeter Waves 1990
Parallel architectures for binary image algebra
- Kung-Shiuh Huang
- 1990
- Optical and Optoelectronic Applied Science and Engineering 1990
Stepper self-metrology using automated techniques
- T.A. Brunner
- J.M. Lewis
- et al.
- 1990
- Microlithography 1990
Using the MAXX simulator for electronic card manufacturing
- S. Buckley
- Chae An
- et al.
- 1990
- WSC 1990
Parallel trace-driven cache simulation by time partitioning
- P. Heidelberger
- Harold S. Stone
- 1990
- WSC 1990
Method for creating consistent bitmaps in message-driven environments
- Atsushi Miyazawa
- Hiroshi Morishima
- et al.
- 1990
- Electronic Imaging: Advanced Devices and Systems 1990