Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Two moment-based model-fitting procedures for the heteroscedastic factor analysis model are introduced and compared. The procedures produce consistent parameter estimators and asymptotically valid inferences for heteroscedasticity without specifying the distributional forms for the factor and heteroscedastic errors. Also, an individual-specific inference procedure for the factor score is developed. Simulation studies show the practical usefulness of the procedures. An example from a morphological measurement study is described.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
W.F. Cody, H.M. Gladney, et al.
SPIE Medical Imaging 1994
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990