Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
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3489 results for Mathematical Sciences
A tetrahedral interpolation technique for color space conversion
- James M. Kasson
- Wil Plouffe
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Developments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
- Patricia G. Blauner
- Andrew D. Dubner
- et al.
- 1993
- Microlithography 1993
Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- Keith T. Kwietniak
- Michael G. Rosenfield
- et al.
- 1993
- Microlithography 1993
Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
Photoresist process latitude optimization for synchrotron x-ray lithography
- Andrew T. Pomerene
- David E. Seeger
- et al.
- 1993
- Microlithography 1993
Generation of tunable, fcintosecond-tiinc-scale, vuv pulses by four-wave difference-frequency mixing in xenon
- J.H. Glownia
- D.R. Gnass
- et al.
- 1993
- SPIE OE/LASE 1993
Scanning capacitance detection and charge trapping in NOS
- B.D. Terris
- R.C. Barrett
- et al.
- 1993
- SPIE OE/LASE 1993
Optical properties of planar and selectively grown SiGe/Si multiple quantum wells
- Detlev A. Grützmacher
- Thomas O. Sedgwick
- et al.
- 1993
- SPIE Physical Concepts of Materials for Novel Optoelectronic Device Applications 1993