Effects of biased cosputtering on resistivity and step coverage in tungsten silicide films
- K.W. Choi
- K.Y. Ahn
- 1985
- JVSTA
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176 results at JVSTA
Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA
Thin films for optical data storage
- Wen-yaung Lee
- 1985
- JVSTA
Unoccupied surface state and conduction band critical points of GaP(110): A high resolution inverse photoemission study
- D. Straub
- M. Skibowski
- et al.
- 1985
- JVSTA
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite films
- J. Perrin
- B. Despax
- et al.
- 1985
- JVSTA
Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- K. Kehler
- J.W. Coburn
- et al.
- 1985
- JVSTA
Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA
Summary Abstract: Titanium silicide films prepared by reactive sputtering
- V. Deline
- F.M. d’Heurle
- 1985
- JVSTA
Summary Abstract: The interaction mechanism of inelastic electron tunneling spectroscopy probed by high resolution electron energy loss spectroscopy
- M. Liehr
- P.A. Thiry
- et al.
- 1985
- JVSTA