Publications

16 results for S. Siddiqui

High Performance Nanosheet Technology Optimized for 77 K
- - R. Bao
  - L. Qin
  - et al.
- 2023
- IEDM 2023
High quality interfacial layer formation for Si_0.75Ge_0.25 (100) high-k metal gate stack
- - S. Siddiqui
  - R. Galatage
  - et al.
- 2020
- Microelectronic Engineering
Future on-chip interconnect metallization and electromigration
- - C. K. Hu‬
  - James Kelly
  - et al.
- 2018
- IRPS 2018
A comparative study of strain and Ge content in Si_1-xGe_x channel using planar FETs, FinFETs, and strained relaxed buffer layer FinFETs
- - Choonghyun Lee
  - Shogo Mochizuki
  - et al.
- 2017
- IEDM 2017
Electromigration and resistivity in on-chip Cu, Co and Ru damascene nanowires
- - C. K. Hu‬
  - James Kelly
  - et al.
- 2017
- IITC 2017
Impact of surface preparation for n-type Si:P and p-type SiGe:B semiconductors on low resistance silicide contacts
- - A. Carr
  - B. Peethala
  - et al.
- 2017
- Microelectronic Engineering
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Technology viable DC performance elements for Si/SiGe channel CMOS FinFTT
- - G. Tsutsui
  - Ruqiang Bao
  - et al.
- 2016
- IEDM 2016
Selective GeO_x-scavenging from interfacial layer on Si_1-xGe_x channel for high mobility Si/Si_1-xGe_x CMOS application
- - Choonghyun Lee
  - H. Kim
  - et al.
- 2016
- VLSI Technology 2016
Impact of HF-based cleaning solutions on via resistance for sub-10 nm BEOL structures
- - B. Peethala
  - F. Mont
  - et al.
- 2016
- Microelectronic Engineering