Publications

10 results for Y. Zhang

Characterizing the effects of etch-induced material modification on the crystallization properties of nitrogen doped Ge₂Sb₂Te ₅
- - J.S. Washington
  - Eric A. Joseph
  - et al.
- 2011
- Journal of Applied Physics
Fluorocarbon high density plasmas. VII. Investigation of selective SiO₂-to-Si₃N₄ high density plasma etch processes
- - Ying Zhang
  - Gottlieb S. Oehrlein
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF₄ and CHF₃
- - G.S. Oehrlein
  - Y. Zhang
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- - O. Joubert
  - G.S. Oehrlein
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- - James W. Corbett
  - Gottlieb S. Oehrlein
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-Resolution Depth Profiling of Ultrathin Silicon Oxide/Nitride/Oxide Layers
- - G.M.W. Kroesen
  - G.S. Oehrlein
  - et al.
- 1993
- JES
Reactive ion etching of SiGe alloys using CF₂Cl₂
- - Ying Zhang
  - Gottlieb S. Oehrlein
  - et al.
- 1992
- Journal of Applied Physics
Reactive ion etching of SiGe alloys using HBr
- - Tim D. Bestwick
  - Gottlieb S. Oehrlein
  - et al.
- 1991
- Applied Physics Letters
Interactive effects in the reactive ion etching of SiGe alloys
- - G.S. Oehrlein
  - Y. Zhang
  - et al.
- 1991
- Applied Physics Letters
Studies of the reactive ion etching of SiGe alloys
- - G.S. Oehriein
  - G.M.W. Kroesen
  - et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films