Publications

18 results for Alan Thomas

When is bilayer thin-film imaging suitable: Comparison with single layer resists
- - Scott Halle
  - Alan Thomas
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Advanced lithography kits: Serifs and hammerhead
- - Hang-Yip Liu
  - Steffen Schulze
  - et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering
Level-specific lithography optimization for 1-Gb DRAM
- - Alfred K. Wong
  - Richard Ferguson
  - et al.
- 2000
- IEEE Trans Semicond Manuf
Approach to pattern aspect ratio control
- - A. Thomas
  - Franz Zach
  - et al.
- 1999
- SPIE Advanced Lithography 1999
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- - Zhijian G. Lu
  - Yuping Cui
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
0.21 μm² 7F² trench cell with a locally-open globally-folded dual bitline for 1 Gb/4 Gb DRAM
- - C. Radens
  - U. Gruening
  - et al.
- 1998
- VLSI Technology 1998
Evaluation of X-ray lithography using a 0.175 μm (0.245 μm² cell area) 1 Gb DRAM technology
- - Rosemary Longo
  - S. Chaloux
  - et al.
- 1998
- VLSI Technology 1998
Scalable low power vertical memory
- - H.I. Hanafi
  - S. Tiwari
  - et al.
- 1995
- IEDM 1995